Curvature-Controlled Defect Localization in Elastic Surface Crystals
Curvature-Controlled Defect Localization in Elastic Surface Crystals
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DOI：
10.1103/physrevlett.116.104301
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发表时间：
2016-03-07
影响因子：
8.6
通讯作者：
Reis, Pedro M.
中科院分区：
文献类型：
--
作者：
Jimenez, Francisco Lopez;Stoop, Norbert;Reis, Pedro M.
我们研究了曲率和拓扑结构对普通弹性双层膜表面晶体凹陷图案的影响。我们的数值分析预测，绝热压缩产生的缺陷总数对于球面、椭球面和环面在广泛的系统尺寸范围内都表现出普遍的二次标度。然而，单个缺陷的局部化和缺陷链的取向都强烈地依赖于表面上的局部高斯曲率及其梯度。我们的结果表明，曲率和拓扑可以用来描绘弹性材料中的缺陷，从而有望改善对分层弯曲、屈曲或折叠过程的控制。总体而言，这项研究表明，双层体系为探索几何诱导力对拓扑电荷组装的影响提供了一个廉价但有价值的实验平台。
We investigate the influence of curvature and topology on crystalline dimpled patterns on the surface of generic elastic bilayers. Our numerical analysis predicts that the total number of defects created by adiabatic compression exhibits universal quadratic scaling for spherical, ellipsoidal, and toroidal surfaces over a wide range of system sizes. However, both the localization of individual defects and the orientation of defect chains depend strongly on the local Gaussian curvature and its gradients across a surface. Our results imply that curvature and topology can be utilized to pattern defects in elastic materials, thus promising improved control over hierarchical bending, buckling, or folding processes. Generally, this study suggests that bilayer systems provide an inexpensive yet valuable experimental test bed for exploring the effects of geometrically induced forces on assemblies of topological charges.