Fabrication of Titanium Dioxide Thin Films by DBD-CVD Under Atmosphere
Fabrication of Titanium Dioxide Thin Films by DBD-CVD Under Atmosphere
复制标题
DOI：
10.1088/1009-0630/9/6/07
复制
发表时间：
2007-12
影响因子：
1.7
通讯作者：
Z. Xiwen;G. Yu;Han Gao-rong
中科院分区：
文献类型：
--
作者：
Z. Xiwen;G. Yu;Han Gao-rong
采用DBD-CVD（介质阻挡放电增强化学气相沉积）技术首次在玻璃衬底上沉积二氧化钛薄膜。采用x射线衍射仪（XRD）、扫描电镜（SEM）对膜的结构进行了表征。常压下沉积的TiO2薄膜表现出优先取向，呈柱状结构，而低压下沉积的TiO2薄膜没有优先取向。具有优先取向的柱状结构，由于柱状结构具有较大的表面积，表现出更高的光催化效率。然而，它对亲水性的改善作用不大。DBD-CVD是制备光催化TiO2的一种替代方法，具有良好的可控性。
Titanium dioxide films were firstly deposited on glass substrate by DBD-CVD (dielectric barrier discharge enhanced chemical vapor deposition) technique. The structure of the films was investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM). TiO2 films deposited under atmosphere pressure show preferred orientation, and exhibit columnar-like structure, while TiO2 films deposited under low gas pressure show no preferred orientation. The columnar-like structure with preferred orientation exhibits higher photocatalytic efficiency, since the columnar structure has larger surface area. However, it contributes little to the improvement of hydrophilicity. DBD-CVD is an alternative method to prepare photocatalytic TiO2 for its well-controllable property.