Fabrication of polarization colour filter device via direct Au film imprinting
Fabrication of polarization colour filter device via direct Au film imprinting
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DOI：
10.1080/09500340.2021.1936245
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发表时间：
2021-06
影响因子：
1.3
通讯作者：
I. Yamada
中科院分区：
文献类型：
--
作者：
I. Yamada
本研究利用直接压印光刻技术在低熔点玻璃上制作出亚波长周期的Au光栅。使用SiC作为模具在425 °C和5kN下压印Au膜。模具的周期、光栅深度和填充因子分别为300 nm、1240 nm和0.5。因此，获得了间距、深度和填充因子分别为300 nm、110 nm和0.7的Au光栅。当入射角为40°时，横向磁场（TM，垂直于光栅的电场矢量）谱在波长642 nm处出现尖锐的峰，TM透射率和消光比分别为30%和12.9 dB。最大消光比在波长和入射角分别为1 μm和60°时为19.0 dB。该工艺比传统的制造工艺更简单且更便宜。
In this study, Au grating with a subwavelength period was fabricated on low-melting glass via direct imprint lithography. The Au film was imprinted at 425 °C and 5 kN using SiC as a mold. The period, grating depth, and fill factor of the mold were 300 nm, ∼240 nm, and 0.5, respectively. Consequently, Au grating with a pitch, depth, and fill factor of 300 nm, ∼110 nm, and 0.7, respectively, was obtained. The transverse magnetic (TM, electric field vector perpendicular to the grating) spectra at an incident angle of 40° exhibited sharp peaks at a wavelength of 642 nm, and the TM transmittance and extinction ratio were 30% and 12.9 dB, respectively. The maximum extinction ratio was 19.0 dB at a wavelength and incident angle of 1 µm and 60°, respectively. This process is simpler and less expensive than the conventional fabrication processes.