Plasmas for additive manufacturing
Plasmas for additive manufacturing
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DOI：
10.1002/ppap.202000009
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发表时间：
2020-05
影响因子：
3.5
通讯作者：
Yongkun Sui;C. Zorman;R. M. Sankaran
中科院分区：
文献类型：
--
作者：
Yongkun Sui;C. Zorman;R. M. Sankaran
最近出现了用于制造材料的增材方法，特别是用于制造三维结构。由于其在薄膜蚀刻和沉积方面的悠久历史，等离子体为与增材制造相关的许多材料和表面工艺提供了独特的优势。在这里，我们回顾了最近主要集中在图案结构的直接书写和印刷材料的后处理方面的努力。介绍了不同的配置、材料和应用。并提出了当前的挑战和未来的展望。
Additive methods for manufacturing materials have recently emerged, particularly for the fabrication of three‐dimensional architectures. Because of their long history in thin‐film etching and deposition, plasmas offer unique advantages for many of the materials and surface processes associated with additive manufacturing. Here, we review recent efforts that have been primarily focused on the direct writing of patterned structures and the post‐treatment of printed materials. Different configurations, materials, and applications are presented. Current challenges and a future outlook are also provided.