Fabrication of nanofigures by focused electron beam-induced deposition
Fabrication of nanofigures by focused electron beam-induced deposition
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DOI：
10.1016/j.tsf.2004.06.078
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发表时间：
2004-10-01
期刊：
影响因子：
2.1
通讯作者：
Yoshimura, M
中科院分区：
文献类型：
--
作者：
Ueda, K;Yoshimura, M
利用聚焦电子束诱导沉积（EBID）技术在场发射扫描电子显微镜（FE-SEM）上对各种金属衬底进行了污染光刻。我们使用泵油（碳氢化合物）作为EBID的前体。结果发现，生长速率是独立的初级电子能量（500至30千电子伏），但从0.34至2.97亩/分钟的元素变化。能量色散X射线（EDX）光谱测量显示，生长的纳米线包含一个衬底元素。在优化的生长条件下，成功地手工制作了具有纳米图形的复杂网格图案。(C)2004 Elsevier B. V.保留所有权利。
Contamination lithography has been performed on various metal substrates by focused electron beam-induced deposition (EBID) technique in a field emission scanning electron microscope (FE-SEM). We used pump oil (hydrocarbon) as precursors for EBID. It was found that the growth rate was independent of primary electron energy (500 to 30 keV) but was varied with elements ranging from 0.34 to 2.97 mu/min. Energy dispersive X-ray (EDX) spectroscopy measurement revealed that the grown nanowire contains a substrate element. A complicated mesh patterns with nanofigures was successfully fabricated manually with optimal growth conditions. (C) 2004 Elsevier B.V. All rights reserved.