Formation of primary amines on silicon nitride surfaces: a direct, plasma-based pathway to functionalization.
Formation of primary amines on silicon nitride surfaces: a direct, plasma-based pathway to functionalization.
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在氮化硅表面形成伯胺：基于等离子体的直接功能化途径。
DOI：
10.1021/la0635653
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发表时间：
2007
期刊：
影响因子：
--
通讯作者：
L. Whitman
中科院分区：
文献类型：
--
作者：
R. Stine;C. L. Cole;K. Ainslie;S. Mulvaney;L. Whitman
氮化硅是生物传感器应用中最常用的钝化层，其中电子元件必须与离子溶液连接。不幸的是，功能化氮化硅表面的主要方法，硅烷化学，缺乏可重复性。作为替代方案，我们已经开发了一种无硅烷途径，其允许通过暴露于用加湿空气供给的射频辉光放电等离子体形成的伯胺的产生来直接官能化氮化硅。胺化的表面，然后可以通过各种方法进一步功能化，在这里，我们证明使用戊二醛作为双功能连接器连接一个强大的中性亲和素（NA）蛋白层。最佳的胺形成，等离子体暴露时间的基础上，通过标记处理过的表面与胺特定的氟化探针和表征的覆盖范围，使用X-射线光电子能谱（XPS）。XPS和放射性标记的研究还表明，等离子体改性的表面相比，硅烷改性的表面，导致类似的NA表面覆盖，但显着更好的再现性。
Silicon nitride is the most commonly used passivation layer in biosensor applications where electronic components must be interfaced with ionic solutions. Unfortunately, the predominant method for functionalizing silicon nitride surfaces, silane chemistry, suffers from a lack of reproducibility. As an alternative, we have developed a silane-free pathway that allows for the direct functionalization of silicon nitride through the creation of primary amines formed by exposure to a radio frequency glow discharge plasma fed with humidified air. The aminated surfaces can then be further functionalized by a variety of methods; here we demonstrate using glutaraldehyde as a bifunctional linker to attach a robust NeutrAvidin (NA) protein layer. Optimal amine formation, based on plasma exposure time, was determined by labeling treated surfaces with an amine-specific fluorinated probe and characterizing the coverage using X-ray photoelectron spectroscopy (XPS). XPS and radiolabeling studies also reveal that plasma-modified surfaces, as compared with silane-modified surfaces, result in similar NA surface coverage, but notably better reproducibility.