Evolution of non-ionic surfactant-templated silicate films at the air-liquid interface
Evolution of non-ionic surfactant-templated silicate films at the air-liquid interface
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非离子表面活性剂模板硅酸盐膜在气液界面的演化
DOI：
10.1039/b716662a
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发表时间：
2008
影响因子：
--
通讯作者：
Fernandez-Martin C
中科院分区：
文献类型：
--
作者：
Fernandez-Martin C
利用Brewster角显微镜(BAM)、时间分辨X射线镜面反射率和掠入射X射线衍射(GIXD)三种技术研究了非离子表面活性剂模板薄膜在空气-水界面的自发生长。还利用小角中子散射(SANS)研究了胶束在亚相溶液中的演化。以正十八醇正十六烷基醚(C16EO8)为表面活性剂，四甲氧基硅烷(TMOS)为二氧化硅前驱体，在酸性条件下制备了薄膜。研究了三种不同的TMOS-C16EO8摩尔比(3.5、7.1和10.8)。二氧化硅前驱体浓度的变化对成膜时间、溶液和成膜机理以及最终成膜结构都有显著的影响。
Spontaneous growth of non-ionic surfactant-templated thin films at the air–water interface was investigated using three techniques: Brewster angle microscopy (BAM), time-resolved off-specular X-ray reflectivity and grazing incidence X-ray diffraction (GIXD). Experiments were also carried out to study the evolution of micelles in the subphase solution using small-angle neutron scattering (SANS). Films were prepared in acidic conditions using octaethylene glycol mono-n-hexadecyl ether (C16EO8) as the surfactant and tetramethyloxysilane (TMOS) as the silica precursor. Three different TMOS–C16EO8 molar ratios (3.5, 7.1 and 10.8) were studied. Variation of the silica-precursor concentration causes a significant effect on the film-formation time, the solution and film-growth mechanisms and the final film structure.