Effect of treatment temperature on surface wettability of methylcyclosiloxane layer formed by chemical vapor deposition

Effect of treatment temperature on surface wettability of methylcyclosiloxane layer formed by chemical vapor deposition
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DOI:
10.1016/j.apsusc.2016.03.149
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发表时间:
2016-08-30
影响因子:
6.7
通讯作者:
Kiguchi, Takayoshi
Kiguchi, Takayoshi
中科院分区:
材料科学1区
文献类型:
--
作者:
Ishizaki, Takahiro;Sasagawa, Keisuke;Kiguchi, Takayoshi

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通过热CVD方法在不同温度下化学吸附1,3,5,7-四甲基环四硅氧烷(TMCTS)分子来调节原生Si氧化物表面的表面润湿性。水接触角测量表明,TMCTS改性的Si氧化物表面在333-373K的温度下的水接触角在92+/-2-102+/-2度的范围内。发现在 333 K 制备的表面的前进和后退水接触角为 97 +/- 2/92 +/- 2 度,显示出低接触角滞后表面。在373-413 K温度下制备的表面的水接触角随着处理温度的升高而增大。当处理温度超过423 K时,TMCTS改性表面的水接触角超过150度,呈现出超疏水表面。 AFM 研究表明,TMCTS 改性表面的表面粗糙度随着处理温度的升高而增加。这种几何形态增强了表面疏水性。表面粗糙度可以通过 CVD 过程中气相中的水解/缩合反应来制造。还使用热重分析仪研究了处理温度对 TMCTS 分子反应性的影响。 (C) 2016 Elsevier B.V. 保留所有权利。
The surface wettability of the native Si oxide surfaces were tuned by chemical adsorption of 1,3,5,7-tetramethylcyclotetrasiloxane (TMCTS) molecules through thermal CVD method at different temperature. Water contact angle measurements revealed that the water contact angles of the TMCTS-modified Si oxide surfaces at the temperature of 333-373 K were found to be in the range of 92 +/- 2-102 +/- 2 degrees. The advancing and receding water contact angle of the surface prepared at 333 K were found to be 97 +/- 2/92 +/- 2 degrees, showing low contact angle hysteresis surface. The water contact angles of the surfaces prepared at the temperature of 373-413 K increased with an increase in the treatment temperature. When the treatment temperature was more than 423 K, the water contact angles of TMCTS-modified surfaces were found to become more than 150 degrees, showing superhydrophobic surface. AFM study revealed that the surface roughness of the TMCTS-modified surface increased with an increase in the treatment temperature. This geometric morphology enhanced the surface hydrophobicity. The surface roughness could be fabricated due to the hydrolysis/condensation reactions in the gas phase during CVD process. The effect of the treatment temperature on the reactivity of the TMCTS molecules were also investigated using a thermogravimetric analyzer. (C) 2016 Elsevier B.V. All rights reserved.