Anti-corrosion film formed on HAl77-2 copper alloy surface by aliphatic polyamine in 3 wt.% NaCl solution

Anti-corrosion film formed on HAl77-2 copper alloy surface by aliphatic polyamine in 3 wt.% NaCl solution
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DOI:
10.1016/j.apsusc.2016.09.118
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发表时间:
2017-01
影响因子:
6.7
通讯作者:
Yinzhe Yu;Dong Yang;Daquan Zhang;Yizhen Wang;Li-xin Gao
Yinzhe Yu;Dong Yang;Daquan Zhang;Yizhen Wang;Li-xin Gao
中科院分区:
材料科学1区
文献类型:
--
作者:
Yinzhe Yu;Dong Yang;Daquan Zhang;Yizhen Wang;Li-xin Gao

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研究了多胺化合物N-(4-氨基- 2,3 -二甲基丁基)- 2,3 -二甲基丁烷- 1,4 -二胺(ADDD)在3wt .% NaCl溶液中对HAl77-2铜合金的缓蚀作用。采用电化学测量、扫描电镜(SEM)、原子力显微镜(AFM)和傅里叶变换红外光谱(FT-IR)等技术进行研究。结果表明,添加d对HAl77-2合金的腐蚀有较强的抑制作用。在0.5 mM处,对ADDD的抑制率为98.6%,优于相同浓度下的苯并三唑(BTAH)。极化曲线表明ADDD为阳极型缓蚀剂。表面分析表明,添加剂与铜的相互作用形成了一层保护膜。FT-IR分析表明,add的缓蚀机制主要是通过化学吸附在铜合金表面形成缓蚀膜。此外,量子化学计算和分子动力学(MD)模拟方法表明,ADDD通过其分子中的氨基吸附在HAl77-2表面。
The corrosion inhibition of a polyamine compound,N-(4-amino-2, 3-dimethylbutyl)-2, 3-dimethylbutane-1, 4-diamine (ADDD), was investigated for HAl77-2 copper alloy in 3 wt.% NaCl solution. Electrochemical measurements, scanning electron microscopy (SEM), atomic force microscope (AFM) and Fourier transform infrared spectroscopy (FT-IR) techniques were employed for this research. The results show that ADDD strongly suppresses the corrosion of HAl77-2 alloy. The inhibition efficiency of ADDD is 98.6% at 0.5 mM, which is better than benzotriazole (BTAH) at the same concentration. Polarization curves indicate that ADDD is an anodic type inhibitor. Surface analysis suggests that a protective film is formed via the interaction of ADDD and copper. FT-IR reveals that the inhibition mechanism of ADDD is dominated by chemisorption onto the copper alloy surface to form an inhibition film. Furthermore, quantum chemical calculation and molecular dynamics (MD) simulations methods show that ADDD adsorbs on HAl77-2 surface via amino group in its molecule.