PREPARATION AND ELECTROCHROMIC PROPERTIES OF RF-SPUTTERED NIOX FILMS PREPARED IN AR/O-2/H-2 ATMOSPHERE
PREPARATION AND ELECTROCHROMIC PROPERTIES OF RF-SPUTTERED NIOX FILMS PREPARED IN AR/O-2/H-2 ATMOSPHERE
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DOI：
10.1143/jjap.33.6656
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发表时间：
1994-12-01
期刊：
影响因子：
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通讯作者：
YAMADA, S
中科院分区：
文献类型：
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作者：
KITAO, M;IZAWA, K;YAMADA, S
采用射频溅射法在Ar/O2/H2混合气体中制备了无色的电致变色氧化镍（NiOx）薄膜。在Ar：O-2：H-2=50：10：40的溅射气氛中，可以制备出高透明的氧化镍薄膜。通过IR和XPS分析，发现沉积态薄膜中含有Ni（OH）（2）的水化产物。当这些膜电化学着色时，已知NiOOH保留在膜中。薄膜在633 nm波长处的着色效率与溅射气氛中的氢含量几乎无关，但与溅射气压有关。在氢气含量为40%、总压为8 Pa时，薄膜的着色效率最高，为36 cm（2）/C。
The preparation of electrochromic nickel oxide (NiOx) films, which are colorless in an as-deposited state, has been carried out in Ar/O-2/H-2 mixed gas by the rf-sputtering method. Highly transparent films of as-deposited nickel oxide could be prepared in the sputtering atmosphere consisting of Ar:O-2:H-2=50:10:40. From IR and XPS measurements, the as-deposited films were found to be hydrated and to have the component of NI(OH)(2). When these films were electrochemically colored, NiOOH was known to remain in the films. The coloration efficiency of the films at the wavelength of 633 nm was nearly independent of hydrogen content in sputtering atmosphere up to 40%, but it depended on sputtering pressure. The maximum value of coloration efficiency was 36 cm(2)/C for films prepared at hydrogen content of 40% and total pressure of 8 Pa.