Photolithographic Structures with Precise Controllable Nanometer-Scale Spacings Created by Molecular Rulers
Photolithographic Structures with Precise Controllable Nanometer-Scale Spacings Created by Molecular Rulers
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由分子尺创建的具有精确可控纳米级间距的光刻结构
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通讯作者:
P.S.Weiss
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作者:
M.E.Anderson;M.Mihok;H.Tanaka;L.P.Tan;M.W.Horn;G S.McCarty;P.S.Weiss