Microstructure and composition of silicon carbide films deposited on carbon fibers by chemical vapor deposition
Microstructure and composition of silicon carbide films deposited on carbon fibers by chemical vapor deposition
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DOI：
10.1007/s002160050950
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发表时间：
1998-08
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影响因子：
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通讯作者：
D. Dietrich;H. Podlesak;G. Marx;B. Wielage
中科院分区：
文献类型：
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作者：
D. Dietrich;H. Podlesak;G. Marx;B. Wielage
用光电子能谱和透射电镜研究了复合材料中用作纤维涂层的CVD碳化硅薄膜的微观结构和成分。薄膜厚度均匀，为50 nm，由平均直径为15 nm的小SiC晶粒组成，在明场图像中显示出条纹对比度。大晶粒的膜厚度的尺寸中的直径被用于通过高分辨率电子显微镜成像的晶格结构。结果进行了讨论，作为一个多型的立方lamellum的几个纳米和中间随机堆叠序列的六方结构。
The microstructure and the composition of CVD silicon carbide films used as fiber coatings in composite materials were investigated by photoelectron spectroscopy and transmission electron microscopy. The films with a uniform thickness of 50 nm consisted of small SiC grains with a mean diameter of 15 nm and showed a stripe contrast in bright field images. Large grains with diameters in the dimension of the film thickness were used for imaging the lattice structure by high-resolution electron microscopy. The results are discussed as a polytype of cubic lamellae of a few nanometers and intermediate random stacking sequences of hexagonal structure.