Iodinated polystyrene: An ion‐millable negative resist
Iodinated polystyrene: An ion‐millable negative resist
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碘化聚苯乙烯：可离子铣削的负性抗蚀剂
DOI：
10.1002/pen.760201603
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发表时间：
1980
影响因子：
3.2
通讯作者：
S. Nonogaki
中科院分区：
文献类型：
--
作者：
H. Shiraishi;Y. Taniguchi;S. Horigome;S. Nonogaki
采用直接碘化法制备了碘化聚苯乙烯（IPS），并对其光刻特性进行了研究。碘化使聚合物对电子束的灵敏度提高了约10倍，达到1 μC/cm2。涂覆的IPS膜非常稳定，即使在220°C预焙10分钟后，也没有观察到暴露特性的变化。发现电子束暴露后在真空中不发生交联。在Ar+轰击下，IPS的铣削速率为0.25 nm/s。这低于在相同条件下得到的聚甲基丙烯酸缩水甘油酯-丙烯酸共乙酯（0.67 nm/s）和坡莫合金（0.42 nm/s）。讨论了碘化敏化的机理。
Iodinated polystyrene (IPS) is obtained by direct iodination of polystyrene and its lithographic characteristics are investigated. The sensitivity of the polymer to electron beams is increased as the result of iodination by a factor of about 10 and reaches 1 μC/cm2. Coated IPS films are very stable and no changes in exposure characteristics are observed even after pre-baking at 220°C for 10 min. It is found that crosslinking does not proceed in a vacuum after electron beam exposure. The milling rate of IPS under Ar+ bombardment is measured to be 0.25 nm/s. This is lower than that of poly(glycidyl methacrylate-co-ethyl acrylate) (0.67 nm/s) and that of permalloy (0.42 nm/s), both obtained under the same conditions. The mechanism of sensitization by iodination is discussed.