Effect of oxygen pressure on pulsed laser deposited WO3 thin films for photoelectrochemical water splitting
Effect of oxygen pressure on pulsed laser deposited WO3 thin films for photoelectrochemical water splitting
复制标题
氧压对脉冲激光沉积 WO3 薄膜光电化学分解水的影响
DOI：
10.1016/j.jallcom.2017.06.108
复制
发表时间：
2017-10-25
影响因子：
6.2
通讯作者：
Zeng, Xierong
中科院分区：
文献类型：
--
作者：
Mai, Manfang;Ma, Xinzhou;Zeng, Xierong
采用脉冲激光沉积技术，在掺氟氧化锡(FTO)玻璃衬底上制备了氧化钨(WO3)薄膜，用于光电化学水的分解。系统地研究了沉积过程中氧气压力对薄膜的结构、形貌、光学性质和光电化学性能的影响。氧分压高于8Pa时，WO(3)薄膜呈现柱状生长特征。在1-13Pa范围内，晶粒度随氧分压的增加而增大，在13~30pa的范围内，随氧分压的进一步增加而减小。在13Pa.以上沉积的样品获得了纯的单斜晶系WO_3相。当氧压降低到8Pa以下时，表面出现亚化学计量比的缺氧相。在0.1M Na2SO4电解液中，在氙灯照射下，13Pa光电流密度高达1.9 mA/cm(2)的薄膜具有最佳的光电化学性能。在此基础上，对三电极构型和双电极构型的析氢行为进行了讨论。(C)2017爱思唯尔B.V.保留所有权利。
Tungsten oxide (WO3) thin films on fluorine-doped tin oxide (FTO) coated glass substrates are fabricated by pulsed laser deposition for photoelectrochemical water splitting. The effects of oxygen pressure during deposition on the structure, morphology, optical properties and photoelectrochemical performance of the films have been systematically evaluated. Columnar growth characteristic ofWO(3) thin films is observed at oxygen pressure higher than 8 Pa. The grain size increases with increasing oxygen pressure in the range of 1-13 Pa then decreases with further increasing oxygen pressure from 13 Pa to 30 Pa. Pure monoclinic phase of WO3 has been obtained for samples deposited above 13 Pa. Decreasing oxygen pressure below 8 Pa leads to an oxygen deficient surface with a substoichiometric phase. The film prepared at 13 Pa exhibits the best photoelectrochemical performance with a photocurrent density as high as 1.9 mA/cm(2) under a xenon lamp illumination in 0.1 M Na2SO4 electrolyte. Furthermore, hydrogen evolution conducted with a three-electrode configuration and a two-electrode configuration is presented and discussed. (C) 2017 Elsevier B.V. All rights reserved.