Organosilica Materials with Bridging Phenyl Derivatives Incorporated into the Surfaces of Mesoporous Solids
Organosilica Materials with Bridging Phenyl Derivatives Incorporated into the Surfaces of Mesoporous Solids
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介孔固体表面掺入桥联苯基衍生物的有机硅材料
DOI:
10.1002/adfm.200701252
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发表时间:
2008
影响因子:
19
通讯作者:
S. Polarz
中科院分区:
文献类型:
--
作者:
A. Kuschel;S. Polarz
An interesting class of materials is mesoporous organosilica materials containing a bridging, organic group along the pore‐surface. Such materials are prepared from silsesquioxane precursors of the type (R′O)3Si‐R‐Si(OR′)3where R is the bridging organic group of interest, in combination with a lyotropic phase as a template for the generation of the pores. A new silsesquioxane precursor, 1,3‐bis‐(trialkoxysilyl)‐5‐bromobenzene, and the related mesoporous organosilica material containing bromobenzene groups located at the pore walls are presented in the current publication. The latter precursor allows access to the derivatization reactions known for halogenated aromatic compounds. Materials containing phenyl derivatives can be obtained either by chemical modifications starting from the mentioned precursor on the molecular scale, or the modifications can be performed directly at the surfaces of the porous material. Materials with surfaces containing benzoic acid, styrene, and phenylphosphonic acid are described.
影响因子:
--
作者:
S. Polarz;R. Regenspurger;J. Hartmann
通讯作者:
J. Hartmann
影响因子:
56.9
作者:
Zhao, DY;Feng, JL;Stucky, GD
通讯作者:
Stucky, GD
影响因子:
8.6
作者:
Boury, B;Ben, F;Nobili, M
通讯作者:
Nobili, M