Effect of Pulse Width on High Power Impulse Magnetron Sputtering for Deposition of Diamond-Like Carbon Thin Films
Effect of Pulse Width on High Power Impulse Magnetron Sputtering for Deposition of Diamond-Like Carbon Thin Films
复制标题
脉冲宽度对高功率脉冲磁控溅射沉积类金刚石碳薄膜的影响
DOI:
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发表时间:
2020
期刊:
影响因子:
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通讯作者:
Hiroyuki Kousaka and Takayuki Ohta
中科院分区:
文献类型:
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作者:
Jo Matsushima;Yuichi Murakami;Akinori Oda;Hiroyuki Kousaka and Takayuki Ohta