Spectroscopic observation of ablation plasma generated with a laser-driven extreme light source
Spectroscopic observation of ablation plasma generated with a laser-driven extreme light source
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激光驱动极端光源产生的烧蚀等离子体的光谱观察
DOI：
10.1007/s00340-015-6041-0
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发表时间：
2015
期刊：
影响因子：
--
通讯作者：
Nishimura
中科院分区：
文献类型：
--
作者：
M. Masuda;N. Tanaka;K. Hane;A. Sunahara;S. Fujioka;and H;Nishimura
研制了一台极紫外（EUV）光源（λ= 9-25 nm，10 Hz），用于研究极紫外烧蚀物理和应用。采用椭圆形全反射镜的EUV光源装置对烧蚀样品进行了优化设计，获得了高达4.2 × 109 W/cm 2的辐照度。利用时间分辨光谱技术对硅板烧蚀等离子体进行了测量，得到了等离子体的电子温度和密度，并与相同辐照度下激光烧蚀等离子体的电子温度和密度进行了比较。讨论了两种源在烧蚀机理上的差异。
An extreme ultraviolet (EUV) light source (λ= 9–25 nm, 10 Hz) was developed to study EUV ablation physics and applications. The EUV source device including an elliptical total reflection mirror was optimized to provide EUV irradiance as high as 4.2 × 109W/cm2on ablation samples. Time-resolved spectroscopic observation of ablation plasma from a Si plate was conducted to derive electron temperature and density, and compared with those for laser-produced ablation at the same irradiance. Difference in ablation mechanism between two sources is discussed.