Direct Optical Lithography of Colloidal InP-Based Quantum Dots with Ligand Pair Treatment
Direct Optical Lithography of Colloidal InP-Based Quantum Dots with Ligand Pair Treatment
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DOI：
10.1021/acsenergylett.3c01019
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发表时间：
2023-09-25
影响因子：
22
通讯作者：
Cho，Himchan
中科院分区：
文献类型：
--
作者：
Lee，Jaehwan;Ha，Jaeyeong;Cho，Himchan
直接光刻技术是一种很有前途的胶体量子点图形化方法。然而，需要采取额外的注意以防止图案化时QD的光学性质的劣化，特别是对于基于InP的QD。本研究提出了一种有效的方法，用于高分辨率图案化的InP基量子点使用光酸产生剂，同时保持其光学特性。具体而言，我们的固态配体交换策略，用长链胺/羧酸盐对配体取代氯配体，成功地将图案化的InP基QD膜的光致发光量子产率（PLQY）恢复到原始PLQY的约67%。在图案化过程中PLQY还原的起源检查后，我们得出结论，由交换的氯化物配体引起的深陷阱的形成是主要原因。最后，我们制作了高分辨率（特征尺寸：1 μm），多色图案的InP基量子点，从而证明了所提出的图案化方法的潜力，为下一代高分辨率显示器和光电器件。
Direct optical lithography presents a promising patterning method for colloidal quantum dots (QDs). However, additional care needs to be taken to prevent deterioration of the optical properties of QDs upon patterning, especially for InP-based QDs. This study proposes an efficient method for high-resolution patterning of InP-based QDs using a photoacid generator while preserving their optical properties. Specifically, our solid-state ligand exchange strategy, replacing chloride ligands with long-chain amine/carboxylate pair ligands, successfully recovered the photoluminescence quantum yield (PLQY) of the patterned InP-based QD films to ∼67% of the original PLQY. Upon examination of the origins of the PLQY reduction during patterning, we concluded that the formation of deep traps caused by the exchanged chloride ligands was the primary cause. Finally, we fabricated high-resolution (feature size: 1 μm), multicolored patterns of InP-based QDs, thereby demonstrating the potential of the proposed patterning method for next-generation high-resolution displays and optoelectronic devices.