Fabrication of micron scale metallic structures on photo paper substrates by low temperature photolithography for device applications
Fabrication of micron scale metallic structures on photo paper substrates by low temperature photolithography for device applications
复制标题
通过低温光刻在相纸基材上制造微米级金属结构，用于设备应用
DOI：
10.1088/0960-1317/25/11/115017
复制
发表时间：
2015
影响因子：
2.3
通讯作者：
David Wood
中科院分区：
文献类型：
--
作者：
M. Cooke;David Wood
使用商业标准纸作为基底具有比其他更昂贵的基底材料显著降低成本约100倍的含义（Shenton等人2015 EMRS Spring Meeting; Zheng等人2013 Nat. Sci. Rep. 3 1786）。这里讨论的是一种新的工艺，它允许光刻和蚀刻简单的金属薄膜沉积在纸基板上，但不需要额外的设施来实现它。这使得一个显着的特征尺寸减少到微米级的设备使用更传统的印刷解决方案，这是几十微米的顺序。该技术具有制造具有附加功能的廉价一次性装置的巨大潜力，这些附加功能可以包括柔性和可折叠性、简单的一次性性、多孔性和低重量要求。商业应用和规模的潜力也进行了讨论。
Using commercial standard paper as a substrate has a significant cost reduction implication over other more expensive substrate materials by approximately a factor of 100 (Shenton et al 2015 EMRS Spring Meeting; Zheng et al 2013 Nat. Sci. Rep. 3 1786). Discussed here is a novel process which allows photolithography and etching of simple metal films deposited on paper substrates, but requires no additional facilities to achieve it. This allows a significant reduction in feature size down to the micron scale over devices made using more conventional printing solutions which are of the order of tens of microns. The technique has great potential for making cheap disposable devices with additional functionality, which could include flexibility and foldability, simple disposability, porosity and low weight requirements. The potential for commercial applications and scale up is also discussed.