Mesoporous Silica Sputter-Coated onto ITO: Electrochemical Processes, Ion Permeability, and Gold Deposition Through NanoPores
Mesoporous Silica Sputter-Coated onto ITO: Electrochemical Processes, Ion Permeability, and Gold Deposition Through NanoPores
复制标题
ITO 上溅镀介孔二氧化硅：电化学过程、离子渗透性和通过纳米孔沉积金
DOI：
10.1002/elan.201200141
复制
发表时间：
2012
期刊：
影响因子：
3
通讯作者：
Vuorema A
中科院分区：
文献类型：
--
作者：
Vuorema A
将50 nm和100 nm厚的“简单”二氧化硅薄膜溅射涂覆到ITO基板上，并显示出具有约100 nm的面内特征的结构。 15 nm和孔<5 nm（基于GISAXS）。 在电化学测量中，观察到膜孔效应。Fe（CN）64−在KNO3水溶液中的氧化电流强烈依赖于电解质浓度。聚阳离子聚（二烯丙基二甲基铵）（PDDA）不能进入这些孔，但吸附在二氧化硅膜的外表面上。在金电沉积过程中，PDDA引起“盘”的生长。金沉积物粘附良好，并且葡萄糖电氧化活性的比较揭示了显著的改善。
“Simple” silica films of 50 nm and 100 nm thickness are sputter‐coated onto ITO substrates and shown to be structured with in‐planed features of ca. 15 nm and pores <5 nm (based on GISAXS). In electrochemical measurements membrane pore effects are observed. The oxidation current for Fe(CN)64−in aqueous KNO3strongly depends on the electrolyte concentration. Poly‐cationic poly(diallyl‐dimethylammonium) (PDDA) cannot enter these pores, but is adsorbed onto the outer surface of the silica film. During gold electrodeposition, PDDA causes growth of “discs”. Gold deposits adhere well and a comparison of glucose electrooxidation activity reveals significant improvements.