Etching of Surfaces with 8-Kev Argon Ions

Etching of Surfaces with 8-Kev Argon Ions
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用 8-Kev 氩离子蚀刻表面

DOI：
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发表时间：
1960
期刊：
影响因子：
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通讯作者：
J. Trillat
J. Trillat
中科院分区：
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文献类型：
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作者：
R. Cunningham;P. Haymann;C. Lecomte;W. Moore;J. Trillat

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用光学和电子显微镜方法研究了能量为8keV的Ar离子轰击固体表面的影响。目标是铝、锌和α刚玉的晶体，以及多晶金和铝。在倾斜离子入射时，形成的蚀刻丘总是沿着离子束方向的表面成分取向。通过离子轰击在高温下对晶体进行刻蚀；这种技术揭示了铝晶体中沿生长方向分布广泛的位错。
Methods of optical and electron microscopy were used to study the effects on solid surfaces of bombardment with argon ions of 8‐kev energy. The targets were crystals of aluminum, zinc and α‐corundum, and polycrystalline gold and aluminum. At oblique ionic incidence, etch hillocks were formed that were invariably oriented along the surface component of the direction of the ionic beam. Crystals were etched by ionic bombardment while being heated at elevated temperatures; this technique revealed dislocations widely spaced along the direction of growth in aluminum crystals.