On the RF Series Resistance Extraction of Nanoscale MOSFETs
On the RF Series Resistance Extraction of Nanoscale MOSFETs
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DOI:
10.1109/lmwc.2008.2003472
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发表时间:
2008-10
影响因子:
3
通讯作者:
G. Choi;S. Hong;Sung-Woo Jung;Y. Jeong
中科院分区:
文献类型:
--
作者:
G. Choi;S. Hong;Sung-Woo Jung;Y. Jeong
A new extraction method of series resistance based on the radio frequency S-parameter measurement for sub -0.1 mum metal oxide semiconductor field-effect transistor is presented. The practical limit of conventional methods is analyzed from measurement and simulation. From this analysis, analytical expressions are derived, and linear regression techniques are used to extract the series resistances. The proposed method improves the accuracy and reduces the measurement frequency.