Extreme-UV photoabsorption spectrum of a laser-produced silicon plasma: evidence for metastable Si ions
Extreme-UV photoabsorption spectrum of a laser-produced silicon plasma: evidence for metastable Si ions
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DOI：
10.1088/0953-4075/31/13/001
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发表时间：
1998-07
期刊：
影响因子：
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通讯作者：
J. Costello;E. Kennedy;J. Mosnier;M. H. Sayyad;C. McGuinness
中科院分区：
文献类型：
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作者：
J. Costello;E. Kennedy;J. Mosnier;M. H. Sayyad;C. McGuinness
利用双激光等离子体技术记录了激光产生的硅等离子体的时间和空间分辨极紫外（XUV）光吸收光谱。在适当的实验条件下，我们已经能够测量由于配置的亚稳态四重奏态的2p-亚壳激发的结构。将实验谱与Cowan原子结构码组计算数据合成的谱进行了比较。利用LS耦合中原子结构计算的特征向量数据来分配大部分观测到的共振结构，并从实验数据中推断出原子硅的一些2p-亚壳电离极限。
Time- and space-resolved extreme ultraviolet (XUV) photoabsorption spectra of a laser-produced silicon plasma have been recorded using a dual-laser-produced plasma technique. Under appropriate experimental conditions we have been able to measure structure due to 2p-subshell excitation from metastable quartet states of the configuration. The experimental spectrum is compared to a spectrum synthesized with computed data from the Cowan suite of atomic structure codes. Eigenvector data from the atomic structure calculations performed in LS coupling are used to assign most of the observed resonance structures and a number of the 2p-subshell ionization limits of atomic silicon are inferred from the experimental data.