Selective gold nano-patterning on flexible polymer substrate via concurrent nanoimprinting and nanotransfer printing
Selective gold nano-patterning on flexible polymer substrate via concurrent nanoimprinting and nanotransfer printing
复制标题
通过并行纳米压印和纳米转移印刷在柔性聚合物基底上选择性金纳米图案
DOI：
10.1016/j.apsusc.2011.08.065
复制
发表时间：
2011
影响因子：
6.7
通讯作者：
H. Low
中科院分区：
文献类型：
--
作者：
J. Law;R.T.T. Khoo;B. S. Tan;H. Low
我们报告了一个简单的技术，选择性的金纳米图案化的非平面聚碳酸酯基板上结合纳米压印和金纳米转移印刷技术在一个单一的并发纳米图案化过程：热纳米压印直接图案的MPTMS（3-巯丙基三甲氧基硅烷）涂覆的聚碳酸酯片，形成非平面的纳米结构，使用金膜沉积模具。同时，将来自模具的金膜选择性地转印到压印的非平面结构的突起或基底上。这种高的纳米图案化选择性是由于硫醇封端的MPTMS-金表面化学的组合效应而实现的，更重要的是，通过表面积依赖的粘附差功来辅助。我们在各种几何形状的非平面聚碳酸酯基底上显示了图案化金的高轮廓，例如柱，凹坑和光栅，低至纳米级分辨率（130 nm）以及超过微米级分辨率（10μm），从而证明这可以是一种通用的金属图案化技术。利用这种技术，我们制作了一个金属纳米线栅偏振器，以展示潜在的器件应用。该技术的主要优点在于其固有的自对准工艺，该工艺简化了在非平面聚合物表面上的选择性Au纳米图案化，这是使用常规图案化技术难以获得的。
We report a simple technique of selective gold nano-patterning on non-planar polycarbonate substrate by combining nanoimprinting and gold nanotransfer printing techniques in a single concurrent nano-patterning process: thermal nanoimprinting directly patterns a MPTMS (3-mercaptopropyl trimethoxysilane)-coated polycarbonate sheet to form the non-planar nanostructures using a gold-film deposited mold. Simultaneously, the gold-film from the mold is selectively transfer-printed either onto the protrusion or the base of the imprinted non-planar structures. This high nano-patterning selectivity is achieved due to a combined effect of a thiol-terminated MPTMS–gold surface chemistry, more importantly, aided by a surface area dependent differential work of adhesion. We show the high delineation of the patterned gold on the non-planar polycarbonate substrate of various geometries such as pillars, dimples, and gratings, down to nano-scale resolution (130nm) as well as over micro-scale resolution (10μm), thus demonstrating that this can be a generic metal patterning technique. Using this technique, we fabricate a metal nanowire grid polarizer to demonstrate a potential device application. The main advantage of this technique lies in its inherent self-aligned process that simplifies selective Au nano-patterning on non-planar polymer surfaces, which is otherwise difficult to be obtained using conventional patterning techniques.