Promotion of the excited electron transfer over Ni- and Co -sulfide co-doped g-C(3)N(4) photocatalyst (g-C(3)N(4)/Ni(x)Co(1-x)S(2)) for hydrogen Production under visible light irradiation.
Promotion of the excited electron transfer over Ni- and Co -sulfide co-doped g-C(3)N(4) photocatalyst (g-C(3)N(4)/Ni(x)Co(1-x)S(2)) for hydrogen Production under visible light irradiation.
复制标题
DOI：
10.1038/s41598-017-08163-y
复制
发表时间：
2017-08-09
影响因子：
4.6
通讯作者：
Bi Y
中科院分区：
文献类型：
--
作者：
Fan K;Jin Z;Yang H;Liu D;Hu H;Bi Y
采用水热法制备了Ni和Co硫化物共掺杂的g-C3 N4光催化剂（g-C3 N4/NixCo 1 − xS 2），由于Ni-Co-S的特殊结构，使得g-C3 N4/NixCo 1 − xS 2表现出优异的光催化性能。在可见光照射下，Co原子的引入使H2的生成量达到最大值，约400.81 μmol，这是由于在界面处有足够的活性暴露，有效地分离了电荷，大大提高了电子转移。通过SEM、XRD、XPS漫反射等表征手段对g-C_3 N_4活性表面的Ni-Co-S结构的存在进行了一系列的研究，结果表明，Ni-Co-S结构的存在是影响活性的关键因素，且两者的结果吻合较好。提出了曙红Y敏化g-C3 N4/NixCo 1 − xS 2光催化剂在可见光照射下可能的反应机理。
A Ni- and Co- sulfide co-doped g-C3N4 photocatalyst (g-C3N4/NixCo1−xS2) was prepared by hydrothermal method and this photocatalyst, namely, g-C3N4/NixCo1−xS2 shown excellent photocatalytic properties due to the special structure of Ni-Co-S with boundary different exposure to active site of transition metal-metal (Ni-Co) active planes. With the introduction of Co atoms, the H2 production amount reached the maximum about 400.81 μmol under continuous visible light irradiation for 4 hours based on the efficiently charge separation and greatly improved electron transfer resulted from the presence of sufficient active exposure at the boundary. The serial studies shown that the existence of Ni-Co-S structure over g-C3N4 active surface is the key factor of activity affections by means of several characterizations such as SEM, XRD, XPS diffuse reflectance etc. and the results of which were in good agreement with each other. A possible reaction mechanism over eosin Y-sensitized g-C3N4/NixCo1−xS2 photocatalyst under visible light irradiation was proposed.
登录
查看更多内容
影响因子：
3.9
作者：
Liu, Qiao;Zhang, Junyan
通讯作者：
Zhang, Junyan
石墨氮化碳粉末可见光下水还原和氧化的光催化活性
影响因子：
3.7
作者：
Maeda, Kazuhiko;Wang, Xinchen;Domen, Kazunari
通讯作者：
Domen, Kazunari
影响因子：
--
作者：
Liu, Jinghai;Zhang, Tiekai;Chen, Wei
通讯作者：
Chen, Wei
影响因子：
19
作者：
Jun, Young-Si;Lee, Eun Zoo;Thomas, Arne
通讯作者：
Thomas, Arne
硼酸根络合物阴离子对ZnxCo3-xO4修饰石墨烯稳定性和析氢行为的影响
影响因子：
3.1
作者：
Hao, Xuqiang;Jin, Zhiliang;Lu, Gongxuan
通讯作者：
Lu, Gongxuan