Self-Narrowing and Photoetching Effects on the Size Distribution of CdS Quantum Dots Prepared by a Reverse-Micelle Method
Self-Narrowing and Photoetching Effects on the Size Distribution of CdS Quantum Dots Prepared by a Reverse-Micelle Method
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自窄化和光刻对反胶束法制备的 CdS 量子点尺寸分布的影响
DOI：
10.1143/jjap.41.5064
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发表时间：
2002
影响因子：
1.5
通讯作者：
M. Nakayama
中科院分区：
文献类型：
--
作者：
Daegwi Kim;N. Teratani;M. Nakayama
我们研究了自缩窄和光蚀刻对CdS量子点尺寸分布的影响。采用反胶束法制备了尺寸分布较窄的量子点，通过改变反胶束中的含水量来控制量子点的平均半径。吸收光谱线形分析所得的平均半径和粒径分布宽度与透射电镜图像的结果吻合较好，表明该分析方法是一种方便、合理的粒径分布宽度估计方法。对于初始尺寸分布大于~ 10%的量子点，观察到由于“自窄过程”导致的尺寸分布减小：尺寸分布宽度随着量子点制备后的时间推移而自发减小。尺寸分布宽度的进一步减小是通过进行光刻处理来实现的。以上结果清楚地显示了利用自缩窄和光蚀刻效应制备具有窄尺寸分布的CdS量子点的可能性。
We have investigated self-narrowing and photoetching effects on the size distribution of CdS quantum dots (QDs). The QDs with a narrow size distribution are prepared by a reverse-micelle method and their mean radii are controlled by changing the water content in the reverse micelle. The mean radius and size-distribution width estimated from the line-shape analysis of absorption spectra agree well with those obtained from transmission electron microscope images, which indicates that the analysis is a convenient and reasonable method of estimating the size-distribution width. For the QDs whose initial size distribution is larger than ∼10%, the size-distribution reduction due to a “self-narrowing process” is observed: The size-distribution width is spontaneously reduced with the time elapsed after the QD preparation. The further reduction of the size-distribution width is achieved by performing a photoetching treatment. The above results clearly show the possibility of preparing CdS QDs with the narrow size distribution by using the self-narrowing and photoetching effects.