Synthesis and properties of nanocomposite MoSiN hard films
Synthesis and properties of nanocomposite MoSiN hard films
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DOI：
10.1016/j.surfcoat.2005.12.046
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发表时间：
2006-10
影响因子：
5.4
通讯作者：
Qiuyun Liu;Q. Fang;F. Liang;Wang Jie;Jiazhi Yang;Cuncheng Li
中科院分区：
文献类型：
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作者：
Qiuyun Liu;Q. Fang;F. Liang;Wang Jie;Jiazhi Yang;Cuncheng Li
采用直流反应磁控溅射法，在500 °C、Ar：N2=2：1、总压为0.5Pa的混合气体中，采用不同面积比的Mo和Si复合靶，制备了不同Si含量（Mo/Si=0.6-4.2）的MoSiN硬质薄膜。结果表明，在低Si含量（Mo/Si=4.2）下，MoSiN薄膜的显微结构为纳米晶n-Mo 2N嵌入非晶基体α-Si 3 N4中的纳米复合结构。然而，在高硅含量下，沉积的MoSiN薄膜的结构是非晶的，通过XRD分析。沉积态MoSiN薄膜的硬度和弹性模量均随Si含量的降低而增加，在Mo/Si=4.2时分别达到30和366 GPa。沉积态MoSiN薄膜的弹性回复率低于40%，摩擦系数在0.22 ~ 0.28之间，与Si含量无关。
MoSiN hard films with different Si content (Mo/Si=0.6–4.2) were deposited at 500 °C in a gas mixture of Ar and N2(Ar:N2=2:1) at a total pressure of 0.5 Pa by DC reactive magnetron sputtering, using a composite target consisting of Mo and Si in different area ratios. It was found that the microstructure of the MoSiN films at low Si content (Mo/Si=4.2) is nanocomposite in which the nanocrystallites n-Mo2N imbedded in the amorphous matrix α-Si3N4. At high silicon content, however, the structure of the as-deposited MoSiN films are amorphous as analysed by XRD. Both hardness and elastic modulus of the as-deposited MoSiN films increase with decreasing Si contents and reach 30 and 366 GPa at Mo/Si=4.2, respectively. The elastic recovery of the as-deposited MoSiN films is below 40% and the friction coefficient is between 0.22 and 0.28 independent of the Si content.