Subsurface damage assessment with atomic force microscopy
Subsurface damage assessment with atomic force microscopy
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发表时间：
1999-04
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通讯作者：
J. Carr;E. Fearon;I. Hutcheon;L. Summers
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作者：
J. Carr;E. Fearon;I. Hutcheon;L. Summers
在高通量应用中，透明光学器件的性能通常由材料的前几百纳米中的不均匀性决定。光学方法无法检测到的缺陷在用于要求高强度、耐化学或机械性或极端光滑度的关键应用时可能会导致灾难性故障。这些缺陷不仅远小于可见光的波长，而且常常隐藏在抛光过程中沉积的一层玻璃状材料下面。在高质量玻璃中，最外层的化学和材料特性通过制造中使用的研磨、研磨和抛光工艺进行修改。一个过程中的每一个后续步骤都被设计成远离前一个操作的损害。然而，任何对表面的力，无论多么轻微，都会留下这种损坏的证据。这些过程不可避免地在表面下区域产生位错、裂纹和塑性变形。
The performance of transparent optics in high fluence applications is often dominated by inhomogeneities in the first few hundred nanometers of material. Defects undetectable with optical methods can cause catastrophic failures when used in critical applications where high strength, chemical or mechanical resistance or extreme smoothness is required. Not only are these defects substantially smaller than the wavelength of visible light, they are often concealed below a layer of glass-like material deposited during the polishing process. In high quality glass, the chemical and material properties of the outermost layer are modified by the grinding, lapping and polishing processes used in fabrication. Each succeeding step in a process is designed to remote damage from the previous operation. However, any force against the surface, no matter how slight will leave evidence of this damage. These processes invariably create dislocations, cracks and plastic deformation in the subsurface region.