Pulsed laser deposition of crystalline garnet waveguides at a growth rate of 20 µm per hour
Pulsed laser deposition of crystalline garnet waveguides at a growth rate of 20 µm per hour
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以每小时 20 µm 的生长速度脉冲激光沉积晶体石榴石波导
DOI：
10.1016/j.surfcoat.2017.12.008
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发表时间：
2018
影响因子：
5.4
通讯作者：
Grant-Jacob J
中科院分区：
文献类型：
--
作者：
Grant-Jacob J
本文报道了用重复频率为100 Hz的准分子激光器脉冲激光沉积高质量的钇铝氧化物和钇镓氧化物晶体，其生长速率接近20 μm/h。该结果表明PLD在100 Hz下将沉积速度提升到工业相关速率的能力。此外，我们表明，使用这种高重复率可能会导致额外的加热的基板，这反过来又会影响薄膜的组成。这种效应被用作对生长材料的组成以及因此折射率的附加控制参数。
We report pulsed laser deposition of high-quality crystalline yttrium aluminium oxide and yttrium gallium oxide with a growth rate approaching 20 μm per hour by using an excimer laser operating at a repetition rate of 100 Hz. This result demonstrates the capability of PLD at 100 Hz for upscaling deposition speeds to a rate that is industrially relevant. In addition, we show that use of this high repetition rate can cause additional heating of the substrate, which in turn affects the film composition. This effect is used as an additional control parameter on the composition, and thus refractive index, of the grown material.