New X-Ray Nanofocusing Devices Based on Total-Reflection Zone Plates
New X-Ray Nanofocusing Devices Based on Total-Reflection Zone Plates
复制标题
基于全反射波带片的新型X射线纳米聚焦装置
DOI：
10.1117/12.892678
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发表时间：
2011
期刊：
影响因子：
--
通讯作者：
T. Tsuji and Y. Kagoshima
中科院分区：
文献类型：
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作者：
H. Takano;T. Tsuji and Y. Kagoshima
X射线纳米聚焦装置能够将X射线聚焦到约10 nm的尺寸。我们已经开发了一种新的纳米聚焦设备，称为全反射波带片（TRZPs），用于聚焦硬X射线区域的高亮度同步辐射。该器件由平面衬底上的反射区图案组成。它有可能将硬X射线聚焦到10纳米以下的尺寸。此外，它比其他硬X射线纳米聚焦设备更容易制造，因为它以非常小的掠入射角使用。我们已经将10 keV的X射线聚焦到子15 nm的尺寸，使用的TRZP是由传统的电子束光刻制造的。此外，我们提出了更有效的设备，具有5纳米的目标焦点尺寸的设计。我们提出并讨论了一种新的方法，实现点聚焦与纳米尺寸。
X-ray nanofocusing devices are capable of focusing X-rays down to sizes of about 10 nm. We have developed a new nanofocusing device, known as total-reflection zone plates (TRZPs), for focusing high-brilliance synchrotron radiation in the hard x-ray region. This device consists of a reflective zone pattern on a flat substrate. It has the potential to focus hard x-rays down to sub-10-nm dimensions. Furthermore, it is considerably easier to fabricate than other hard x-ray nanofocusing devices since it is used with a very small grazing incidence angle. We have focused 10-keV x-rays to sub-15 nm dimensions using a TRZP that was fabricated by conventional electron-beam lithography. In addition, we present designs for more efficient devices that have a target focus size of 5 nm. We propose and discuss a new approach for achieving point focusing with nanometer dimensions.