Fluoropolymer resists: Progress and properties
Fluoropolymer resists: Progress and properties
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DOI：
10.2494/photopolymer.16.523
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发表时间：
2003-01-01
影响因子：
0.8
通讯作者：
DiPietro, RA
中科院分区：
文献类型：
--
作者：
Ito, H;Truong, HD;DiPietro, RA
过去几年，各种新型含氟聚合物已被制备用于 157 nm 光刻。虽然有几种不同的主链结构可供选择，但所有这些 157 nm 聚合物的共同点是专门使用六氟异丙醇 (HFA) 作为酸基团。主要努力致力于减少 157 nm 处的吸收。此外，我们将注意力集中在疏水性-亲水性平衡上，并了解 HFA 部分与其他官能团的相互作用以及 HFA 聚合物的溶解行为。最初，我们开发了四个平台； a) 全丙烯酸，b) 全降冰片烯，3) 脂肪族，和 4) 芳香族体系。基于 2-三氟甲基丙烯酸单体的全丙烯酸系统旨在用于工具测试，而基于带有 HFA 悬垂的降冰片烯 (NBHFA) 的全降冰片烯系统主要针对 193 nm 应用而设计 (COBRA 5000)。由于基于 2-三氟甲基丙烯酸叔丁酯 (TBTFMA) 与苯乙烯 HFA (STHFA) 的共聚物的芳香族体系 (PF2-ESCAP) 具有 3.2/mum 的相当高的吸收率，因此我们的主要开发工作针对基于 TBTFMA 和 NBHFA 或乙烯基醚的共聚物的脂肪族体系。新的共聚物是通过 TBTFMA 与带有 HFA 的乙烯基醚的自由基共聚制备的，从而产生较低的吸收和较低/可控的玻璃化转变温度。除了具有极性乙烯基醚的新型共聚物之外，还描述了 HFA 聚合物的溶解行为和氢键相互作用。
Various new fluoropolymers have been prepared for use in 157 nm lithography in the last few years. While several different backbone structures are available, what is common to all these 157 nm polymers is the exclusive use of hexafluoroisopropanol (HFA) as an acid group. The major effort has been placed on reduction of the absorption at 157 nm. In addition, we focused our attention on the hydrophobicity-hydrophilicity balance and understanding of the interaction of the HFA moiety with other functional groups and the dissolution behavior of the HFA polymers. Initially, we developed four platforms; a) all-acrylic, b) all-norbomene, 3) aliphatic, and 4) aromatic systems. The all-acrylic system based on 2-trifluoromethylacrylic monomers was meant to be for tool-testing and the all-norbornene system based on norbornene with pendant HFA (NBHFA) has been primarily 2 engineered for 193 nm application (COBRA 5000). Since the aromatic system (PF2-ESCAP) based on a copolymer of t-butyl 2-trifluoeomethylacrylate (TBTFMA) with styrene bearing HFA (STHFA) has a rather high absorption of 3.2/mum, our major development effort has been directed to the aliphatic system based on a copolymer of TBTFMA and NBHFA or vinyl ether. New copolymers have been prepared by radical copolymerization of TBTFMA with vinyl ethers bearing HFA, resulting in lower absorption and lower/controllable glass transition temperatures. In addition to the new copolymers with polar vinyl ethers, the dissolution behavior and hydrogen bonding interaction of HFA polymers are described.