Work Function and Electrical Conductivity of Hydrogen Covered Nickel Films. The Effect of Contamination
Work Function and Electrical Conductivity of Hydrogen Covered Nickel Films. The Effect of Contamination
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氢覆盖镍薄膜的功函数和电导率。
DOI：
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发表时间：
1956
期刊：
影响因子：
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通讯作者：
W. Sachtler
中科院分区：
文献类型：
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作者：
W. Sachtler
研究了氢在蒸镀镍膜上的吸附，并对其电导率和光电发射率的变化进行了研究。结果发现，氢吸附在非常干净的镍表面上会导致导电性立即下降，功函数增加。然而，在被污染的膜上，吸附是缓慢的，并且其对电导率和功函数的影响是相反的;即，功函数降低而电导率增加。
Hydrogen was adsorbed on evaporated nickel films, and the change in electric conductivity and photoelectric emissivity was investigated. It was found that hydrogen adsorption on extremely clean nickel surfaces causes an immediate decrease in conductivity and an increase in work function. On contaminated films, however, the adsorption is slow and its effects on conductivity and work function are of opposite sign; i.e., work function is decreased and conductivity is increased.