Synthesis of fluorinated graphene with tunable degree of fluorination
Synthesis of fluorinated graphene with tunable degree of fluorination
复制标题
氟化程度可调的氟化石墨烯的合成
DOI：
10.1016/j.carbon.2012.07.026
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发表时间：
2012-12-01
期刊：
影响因子：
10.9
通讯作者：
Yang, Shengrong
中科院分区：
文献类型：
--
作者：
Wang, Zhaofeng;Wang, Jinqing;Yang, Shengrong
通过分散的氧化石墨烯与氢氟酸反应，实现了一种简单、低成本、有效的碳氟比（R-C/F）可调的氟化石墨烯的合成。结果表明，氟被接枝到石墨烯的基面上，并且R-C/F可以通过控制反应条件容易地调节。所合成的氟化石墨烯具有1-2层厚度的片状形貌，带隙能量在1.82 - 2.99 eV之间可调，在光电子和光子器件中具有潜在的应用价值。(C)2012爱思唯尔有限公司保留所有权利。
An easy, low-cost and effective synthesis of fluorinated graphene with tunable C/F atomic ratio (R-C/F) has been realized by the reaction between dispersed graphene oxide and hydrofluoric acid. The results show that fluorine is grafted onto the basal plane of graphene, and the R-C/F can be easily adjusted by controlling the reaction conditions. The as-synthesized fluorinated graphene exhibits a sheet-like morphology with 1-2 layered thickness and tunable bandgap energy from 1.82 to 2.99 eV, which has potential applications in optoelectronic and photonic devices. (C) 2012 Elsevier Ltd. All rights reserved.