Polarization enhancing optical system for a high-resolution VUV spectroscopic facility at a synchrotron light source.
Polarization enhancing optical system for a high-resolution VUV spectroscopic facility at a synchrotron light source.
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用于同步加速器光源高分辨率 VUV 光谱设备的偏振增强光学系统。
DOI：
10.1364/ao.23.004034
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发表时间：
1984
期刊：
影响因子：
1.9
通讯作者：
M. Ginter
中科院分区：
文献类型：
--
作者：
C. Brown;M. Ginter
在本文中，我们描述了一个反射光学系统的设计，作为一个新的高分辨率VUV光谱仪设施的一部分，在SURF II光源在国家标准局。该系统使用三个圆柱形镜子将存储环源的图像聚焦在距离源点10米的6.65米真空光谱仪的入口狭缝上。图像属性和聚焦技术演示了光线跟踪图和可见光图像。VUV的反射率较大，且反射镜定向，使得水平偏振同步辐射的电矢量始终垂直于入射面。根据波长和所选择的涂层材料的不同，光束的s和p偏振分量的透射率可能有很大的差异，在500-2000-A范围内，偏振纯度>为95%，λ >为1000 A时，其值可能高达99%。
In this paper we describe a reflecting optical system designed as part of a new high-resolution VUV spectrometer facility at the SURF II light source at the National Bureau of Standards. The system employs three cylindrical mirrors to focus an image of the storage ring source on the entrance slit of a 6.65-m vacuum spectrometer located 10 m from the source point. Image properties and focusing techniques are demonstrated with ray-trace diagrams and visible light images. Reflectance values in the VUV are large and the mirrors are oriented so that the electric vector of horizontally polarized synchrotron radiation is always perpendicular to the plane of incidence. Depending on the wavelength and coating material chosen, large differences in the transmittance for the s and p polarization components of the light beam are possible, with polarization purities >95% expected throughout the 500–2000-A range and values as high as 99% possible for λ > 1000 A.