Supercritical Fluid Deposition of Conformal SrTiO3 Films with Composition Uniformity in Nanocontact Holes
Supercritical Fluid Deposition of Conformal SrTiO3 Films with Composition Uniformity in Nanocontact Holes
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纳米接触孔中成分均匀的共形 SrTiO3 薄膜的超临界流体沉积
DOI：
10.1149/1.3092891
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发表时间：
2009
影响因子：
--
通讯作者：
Hyungjun Kim
中科院分区：
文献类型：
--
作者：
Junghoon Lee;J. Son;Han‐Bo‐Ram Lee;Heungsun Lee;D. Ma;Choon;Hyungjun Kim
SrTiO 3具有高介电常数，被认为是一种很有前途的动态随机存储器电容介质。迄今为止，化学气相沉积（CVD）和原子层沉积（ALD）难以在高深宽纳米孔内沉积成分均匀且完美保形的SrTiO 3。在这项研究中，我们报告了超临界流体沉积（SCFD）的SrTiO 3。与CVD SrTiO3相比，SCFD SrTiO3具有良好的共形性和纳米孔内成分的均匀性.从这些结果来看，SCFD有望成为CVD和ALD SrTiO 3的化学计量和保形性问题的解决方案。
SrTiO 3 with a high dielectric constant is considered a promising capacitor dielectric for dynamic random access memory. Until now, a SrTiO 3 deposition with compositional uniformity and perfect conformality inside high-aspect nanoscale holes has been difficult by chemical vapor deposition (CVD) and atomic layer deposition (ALD). In this study, we report a supercritical fluid deposition (SCFD) of SrTiO 3 . Compared to CVD SrTiO 3 , the SCFD SrTiO 3 showed perfect conformality and compositional uniformity inside nanosize holes. From these results, the SCFD is expected to be a solution for the stoichiometry and conformality issues of the CVD and ALD SrTiO 3 .