Orientation studies of Si-phthalocyanine sulfonic acids cast on SiOx substrates
Orientation studies of Si-phthalocyanine sulfonic acids cast on SiOx substrates
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SiOx 基底上硅酞菁磺酸的取向研究
DOI：
10.1007/s003390201320
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发表时间：
2003
期刊：
影响因子：
--
通讯作者：
D. Schmeißer
中科院分区：
文献类型：
--
作者：
Guenter Appel;H. Ade;A. Guerek;S. Stadler;R. Mikalo;D. Schmeißer
采用溶液浇铸法制备了层状的二羟基硅酞菁四磺酸和低聚μ-氧基硅酞菁四磺酸。用X-射线光电子能谱检测了材料的纯度。用变角近边X射线吸收精细结构谱研究了分子相对于衬底平面的取向。用原子力显微镜对其形貌进行了表征。大多数样品表现出明显的取向，并伴随着晶体结构；其他样品根本没有取向，以非晶态为主。这一行为表明，几个制备参数影响着酞菁的结晶度和取向。
Layers of dihydroxy silicon phthalocyanine tetrasulfonic acid and oligo-μ-oxo silicon phthalocyanine tetrasulfonic acid were prepared by solution-casting methods. The purity of the material was checked by X-ray photoemission spectroscopy. The orientation of the molecules in respect to the substrate plane was investigated by angle-dependent near-edge X-ray absorption fine-structure spectroscopy. The morphology was characterized by atomic force microscopy. Most samples exhibited a significant orientation that was accompanied by crystalline structures; others had no orientation at all with a dominant amorphous morphology. This behavior indicates that several preparation parameters affect the crystallinity and the orientation of the phthalocyanines.