Photochemistry of tetracene adsorbed on dry silica: Products and mechanism
Photochemistry of tetracene adsorbed on dry silica: Products and mechanism
复制标题
DOI：
10.1111/j.1751-1097.1996.tb02424.x
复制
发表时间：
1996-07-01
影响因子：
3.3
通讯作者：
Sigman, ME
中科院分区：
文献类型：
--
作者：
Dabestani, R;Nelson, M;Sigman, ME
在非常低的表面覆盖率(小于单分子膜的3%)下，在干燥的二氧化硅上研究了四茂铁(1)的光化学。吸附在二氧化硅表面的脱气样品1的辐射过程非常缓慢，产生同步(2)和反(3)二聚体。在充气条件下，1，4-二氯苯酚在表面覆盖层上的光解
The photochemistry of tetracene (1) has been studied on dry silica at very low surface coverages (less than 3% of a monolayer). Irradiation of degassed samples of 1 adsorbed on silica surface proceeds very slowly to produce both syn (2) and anti (3) dimers. Under aerated conditions photolysis of 1 at surface coverages