UV-Enhanced Sacrificial Layer Stabilised Graphene Oxide Hollow Fibre Membranes for Nanofiltration.
UV-Enhanced Sacrificial Layer Stabilised Graphene Oxide Hollow Fibre Membranes for Nanofiltration.
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DOI：
10.1038/srep15799
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发表时间：
2015-11-03
影响因子：
4.6
通讯作者：
Li K
中科院分区：
文献类型：
--
作者：
Chong JY;Aba NF;Wang B;Mattevi C;Li K
氧化石墨烯（GO）膜在气体分离和液体过滤中显示出巨大的潜力。对于高档应用，中空纤维几何形状的GO膜由于在模块级的高效率和易于组装的特征而特别令人感兴趣。然而，发现GO膜在陶瓷中空纤维基底上在干燥状态下不稳定，主要是由于干燥相关的收缩，这限制了GO膜的应用和后处理。我们在这里证明，GO中空纤维膜可以通过使用多孔聚（甲基丙烯酸甲酯）（PMMA）牺牲层，这在中空纤维基底和GO膜之间产生空间，从而允许无应力收缩来稳定。成功地确定了无缺陷的GO中空纤维膜，并且该膜在长期（1200小时）气密稳定性测试中是稳定的。还在空气中成功地完成了用UV光对GO膜的后处理，这引起了膜中受控的微观结构缺陷的产生并增加了膜表面的粗糙度因子。经UV处理的GO膜的渗透性对于水从0.07 L m−2 h−1 bar−1大幅提高至2.8 L m−2 h−1 bar−1，对于丙酮从0.14 L m−2 h−1 bar−1大幅提高至7.5 L m−2 h−1 bar−1，而低分子量截留值（~250 Da）不变。
Graphene oxide (GO) membranes have demonstrated great potential in gas separation and liquid filtration. For upscale applications, GO membranes in a hollow fibre geometry are of particular interest due to the high-efficiency and easy-assembly features at module level. However, GO membranes were found unstable in dry state on ceramic hollow fibre substrates, mainly due to the drying-related shrinkage, which has limited the applications and post-treatments of GO membranes. We demonstrate here that GO hollow fibre membranes can be stabilised by using a porous poly(methyl methacrylate) (PMMA) sacrificial layer, which creates a space between the hollow fibre substrate and the GO membrane thus allowing stress-free shrinkage. Defect-free GO hollow fibre membrane was successfully determined and the membrane was stable in a long term (1200 hours) gas-tight stability test. Post-treatment of the GO membranes with UV light was also successfully accomplished in air, which induced the creation of controlled microstructural defects in the membrane and increased the roughness factor of the membrane surface. The permeability of the UV-treated GO membranes was greatly enhanced from 0.07 to 2.8 L m−2 h−1 bar−1 for water, and 0.14 to 7.5 L m−2 h−1 bar−1 for acetone, with an unchanged low molecular weight cut off (~250 Da).