The Calculation of Electron Diffraction Intensities
The Calculation of Electron Diffraction Intensities
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DOI：
10.1088/0370-1328/80/2/301
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发表时间：
1962-08
期刊：
影响因子：
--
通讯作者：
L. Sturkey
中科院分区：
文献类型：
--
作者：
L. Sturkey
本文发展了一种计算多个同时反射时电子衍射强度的一般方法。使用了“散射矩阵”的指数函数，数值计算很容易系统化，并可用于各种厚度。该方法的一般性和实用性证明了许多情况下的应用程序，特别是不完美的晶体的电子显微镜图像，并描述了适当的程序处理吸收。详细介绍了两种典型的数值计算，一种是五个同时反射，另一种是二十一个，以证明这些和更近似的处理之间的差异。
A general method is developed for calculating electron diffraction intensities when many simultaneous reflections are considered. The exponential function of a `scattering matrix' is used, and numerical calculations are easily systematized and performed for various thicknesses. The generality and utility of the method is demonstrated by applications to many cases, especially to electron microscope images of imperfect crystals, and the proper procedure for treating absorption is described. Two typical numerical computations are presented in detail, one for five simultaneous reflections and the other for twenty-one, to demonstrate the differences between these and more approximate treatments.