FACETING INDUCED BY ULTRATHIN METAL FILMS ON W(111) AND Mo(111): STRUCTURE, REACTIVITY, AND ELECTRONIC PROPERTIES
FACETING INDUCED BY ULTRATHIN METAL FILMS ON W(111) AND Mo(111): STRUCTURE, REACTIVITY, AND ELECTRONIC PROPERTIES
复制标题
W(111) 和 Mo(111) 上超薄金属膜引起的刻面:结构、反应性和电子性能
DOI:
--
复制
发表时间:
1996
期刊:
影响因子:
--
通讯作者:
R. A. Campbell
中科院分区:
文献类型:
--
作者:
T. Madey;J. Guan;C. Nien;C. Dong;H.;R. A. Campbell
We have studied ultrathin films of transition and noble metals on Mo(111) and W(111) using Auger spectroscopy, LEED, thermal desorption spectroscopy (TDS) and scanning tunneling microscopy (STM). The atomically rough, open bcc(111) surfaces are morphologically unstable when covered by films ≥ 1 monolayer thick of certain metals, i.e. they form faceted structures. For example, using a UHV STM to study Pd/W(111), we find that the Pd-covered W(111) surface becomes completely faceted to three-sided {211} pyramids upon annealing, for Pd coverages greater than a critical coverage θc. Formation of pyramidal facets also occurs when W(111) or Mo(111) surfaces are dosed with Pt, Au, Ir, Rh, oxygen or sulfur. In contrast, monolayer films of Ti, Co, Ni, Cu, Ag and Gd do not induce massive reconstruction or faceting on W(111) and Mo(111) surfaces. The faceting appears to be thermodynamically driven but kinetically limited: faceting is caused by an increased anisotropy in surface free energy that occurs for the film-co...