Edge transfer lithography using alkanethiol inks
Edge transfer lithography using alkanethiol inks
复制标题
DOI：
10.1021/nl0607885
复制
发表时间：
2006-06-01
期刊：
影响因子：
10.8
通讯作者：
Poelsema, Bene
中科院分区：
文献类型：
--
作者：
Sharpe, Ruben B. A.;Titulaer, Bram J. F.;Poelsema, Bene
边缘光刻图案化技术基于利用微米尺寸模板特征的边缘来复制亚微米结构。边缘转移光刻 (ETL) 通过沿着弹性体印模的特征边缘选择性地将自组装单分子层沉积到金属基板上，可以在一个步骤中进行局部表面修改。本报告描述了两种印模设计，现在允许在 ETL 中使用链烷硫醇油墨，并将其用作抗蚀剂，以在金中复制亚微米结构。经各向异性改性的印模被证明能够将极高分辨率图案的潜力与微接触印刷的多功能性和简单性结合起来。
Edge lithographic patterning techniques are based on the utilization of the edges of micrometer-sized template features for the reproduction of submicrometer structures. Edge transfer lithography (ETL) permits local surface modification in a single step by depositing self-assembled monolayers onto a metal substrate selectively along the feature edges of an elastomeric stamp. In this report two stamp designs are described that now allow for the use of alkanethiol inks in ETL and their use as etch resists to reproduce submicrometer structures in gold. Anisotropically modified stamps are shown to combine the potential for very high-resolution patterning with the versatility and simplicity of microcontact printing.