Removing process of the three-dimension periodic nanostructure fabricated from KMPR photoresist
Removing process of the three-dimension periodic nanostructure fabricated from KMPR photoresist
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DOI：
10.7567/1347-4065/ab0dea
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发表时间：
2019-05
影响因子：
1.5
通讯作者：
Xudongfang Wang;Y. Ishikawa;S. Araki;M. Uenuma;Y. Uraoka
中科院分区：
文献类型：
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作者：
Xudongfang Wang;Y. Ishikawa;S. Araki;M. Uenuma;Y. Uraoka
具有光子和声子晶体的三维周期纳米结构在能源科学、微流体和半导体等新技术和研究方面具有巨大的潜力。以前的研究主要集中在使用高压、高温和高成本的工艺，如化学气相沉积或物理气相沉积。在这项工作中，三维纳米结构通过一种简单而经济有效的方法被称为邻近场纳米图案（PnP）工艺制造。先前的研究表明，3D纳米结构可以通过使用SU-8抗蚀剂的PnP工艺制造。我们的研究使用了KMPR （MicroChem）负光刻胶，它可以通过水显影剂处理，并通过溶液法去除。我们研究了KMPR周期三维纳米结构与SU-8 3D纳米结构的Talbot距离、高度和周期性。此外，我们展示了一种简单的溶液去除工艺，用于制造逆三维纳米结构，可以扩展到许多应用。
Three-dimensional (3D) periodic nanostructures with photonic and phononic crystals have enormous potential for new technology and research for example energy science, microfluidics and semiconductors. Previous studies have focused on using high pressure, high temperature and high cost processes like chemical vapor deposition or physical vapor deposition. In this work, 3D nanostructures were fabricated through a simple and cost effective method called the proximity field nano-patterning (PnP) process. Previous research has shown that 3D nanostructures can be fabricated via a PnP process using an SU-8 resist. Our research uses a KMPR (MicroChem) negative photoresist, which can be processed through an aqueous developer and removed by solution process. We investigated the Talbot distance, height, and periodicity of the KMPR periodic 3D nanostructure versus the SU-8 3D nanostructure. Furthermore, we demonstrate a facile solution removal process for the resist to fabricate inverse 3D nanostructures which can be extended to many applications.