In-plane hyperbolic polariton tuners in terahertz and long-wave infrared regimes.
In-plane hyperbolic polariton tuners in terahertz and long-wave infrared regimes.
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DOI:
10.1038/s41467-023-38214-0
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发表时间:
2023-05-11
影响因子:
16.6
通讯作者:
Deng, Shaozhi
中科院分区:
文献类型:
--
作者:
Huang, Wuchao;Folland, Thomas G. G.;Sun, Fengsheng;Zheng, Zebo;Xu, Ningsheng;Xing, Qiaoxia;Jiang, Jingyao;Chen, Huanjun;Caldwell, Joshua D. D.;Yan, Hugen;Deng, Shaozhi
One of the main bottlenecks in the development of terahertz (THz) and long-wave infrared (LWIR) technologies is the limited intrinsic response of traditional materials. Hyperbolic phonon polaritons (HPhPs) of van der Waals semiconductors couple strongly with THz and LWIR radiation. However, the mismatch of photon − polariton momentum makes far-field excitation of HPhPs challenging. Here, we propose an In-Plane Hyperbolic Polariton Tuner that is based on patterning van der Waals semiconductors, here α-MoO3, into ribbon arrays. We demonstrate that such tuners respond directly to far-field excitation and give rise to LWIR and THz resonances with high quality factors up to 300, which are strongly dependent on in-plane hyperbolic polariton of the patterned α-MoO3. We further show that with this tuner, intensity regulation of reflected and transmitted electromagnetic waves, as well as their wavelength and polarization selection can be achieved. Our results can help the development of THz and LWIR miniaturized devices. In-plane hyperbolic phonon polaritons in α-MoO3 crystals hold promise for terahertz (THz) and longwave infrared (LWIR) photonic applications, but their coupling with far-field excitations remains challenging. Here, the authors report the fabrication of α-MoO3 ribbon arrays that can be applied as tunable THz and LWIR filters and polarizers.
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影响因子:
16.6
作者:
Caldwell, Joshua D.;Kretinin, Andrey V.;Novoselov, Kostya S.
通讯作者:
Novoselov, Kostya S.
影响因子:
16.6
作者:
Alfaro-Mozaz, F. J.;Rodrigo, S. G.;Nikitin, A. Y.
通讯作者:
Nikitin, A. Y.
影响因子:
38.3
作者:
Caldwell, Joshua D.;Vurgaftman, Igor;Reinecke, Thomas L.
通讯作者:
Reinecke, Thomas L.
影响因子:
10.8
作者:
Duan, Jiahua;Capote-Robayna, Nathaniel;Alonso-Gonzalez, Pablo
通讯作者:
Alonso-Gonzalez, Pablo
影响因子:
19.4
作者:
Autore, Marta;Li, Peining;Hillenbrand, Rainer
通讯作者:
Hillenbrand, Rainer