An approach to run-to-run control for rapid thermal processing
An approach to run-to-run control for rapid thermal processing
复制标题
一种用于快速热处理的运行控制方法
DOI：
10.1109/acc.1995.520957
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发表时间：
1995
期刊：
影响因子：
--
通讯作者：
G. Gattu
中科院分区：
文献类型：
--
作者：
E. Zafiriou;R. Adomaitis;G. Gattu
This paper introduces a new approach to run-to-run (RtR) control for semiconductor manufacturing processes. It is based on a technique developed for batch-to-batch operating profile modification for batch chemical processes. It is particularly appropriate for rapid thermal processing (RTP) reactors, where the recipe includes a function of time and the optimization requires the use of dynamic models. Our technique modifies the profile between runs directly, without requiring re-modeling or the adaptation of model parameters. This is accomplished by combining the existing model with process measurement information and obtaining a direction of improvement by utilizing the similarity between iterations in numerical optimization and runs in RtR control. The example that is used to illustrate the method is motivated by an overheating problem that was observed experimentally and reported in the literature. A very simple set of model and plant equations are used to emulate the model-plant mismatch.
