Properties of Li-Doped ZnO Films Deposited on Diamond Films
Properties of Li-Doped ZnO Films Deposited on Diamond Films
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金刚石薄膜上沉积的掺锂 ZnO 薄膜的性能
DOI：
10.4028/www.scientific.net/kem.544.234
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发表时间：
2013
期刊：
影响因子：
--
通讯作者：
Yiben Xia
中科院分区：
文献类型：
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作者：
M. Lin;L. Wang;Jian Huang;K. Tang;B. Ren;Jie Zhou;Yiben Xia
采用射频磁控溅射方法在自支撑金刚石（FSD）薄膜的成核侧沉积Li掺杂氧化锌（ZnO）薄膜。利用X射线衍射(XRD)拉曼光谱、半导体表征系统和霍尔效应测量系统研究了氧分压对ZnO薄膜的结构、光学和电学性能的影响。结果表明，引入氧气作为反应气体有助于提高Li掺杂ZnO薄膜的结晶质量。
Li-doped zinc oxide (ZnO) films were deposited on nucleation side of freestanding diamond (FSD) films by the radio frequency magnetron sputtering method. The effect of oxygen partial pressure on structural, optical and electrical properties of the ZnO films was investigated by X-ray diffraction (XRD) Raman spectroscopy, semiconductor characterization system and Hall effect measurement system. The results showed that the introduction of oxygen as a reactive gas was helpful to improve the crystalline quality of Li-doped ZnO films.
ZnO : X (X = Li, Mg) 薄膜的电光性质
DOI：
--
发表时间：
2002
期刊：
Journal of Crystal Growth 237
影响因子：
--
作者：
T.Nagata;T.Shimura;A.Ashida;N.Fujimura;T.Ito
通讯作者：
T.Ito