Study on Dissolution Behavior of Poly(4-hydroxystyrene) as Model Polymer of Chemically Amplified Resists for Extreme Ultraviolet Lithography
Study on Dissolution Behavior of Poly(4-hydroxystyrene) as Model Polymer of Chemically Amplified Resists for Extreme Ultraviolet Lithography
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聚(4-羟基苯乙烯)作为极紫外光刻化学放大光刻胶模型聚合物溶解行为的研究
DOI：
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发表时间：
2015
期刊：
影响因子：
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通讯作者：
and T. Kozawa
中科院分区：
文献类型：
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作者：
M. Mitsuyasu;H. Yamamoto;and T. Kozawa
