Electrostatic Coupling of Antenna and the Shielding Effect in Inductive RF Plasmas
Electrostatic Coupling of Antenna and the Shielding Effect in Inductive RF Plasmas
复制标题
天线静电耦合与感应射频等离子体中的屏蔽效应
DOI：
10.1143/jjap.33.2189
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发表时间：
1994
影响因子：
1.5
通讯作者：
Keiji Suzuki Keiji Suzuki
中科院分区：
文献类型：
--
作者：
H. Sugai;Kenji Nakamura Kenji Nakamura;Keiji Suzuki Keiji Suzuki
电流流动天线与感应射频等离子体的电容耦合不仅在放电机制中起着重要作用，而且在天线周围材料的杂质释放中也起着重要作用。由于这种耦合，在使天线导体与等离子体绝缘的材料表面出现了一个很大的负直流电压（V dc）。直流电压的大小直接测量为射频功率、绝缘材料厚度和沿天线位置的函数。提出了一个描述静电天线-等离子体耦合的简单模型。此外，还讨论了法拉第屏蔽对电感耦合射频放电的影响。
Capacitive coupling from a current-flowing antenna to inductive rf plasma plays an important role not only in the discharge mechanism but also in the impurity release from materials around the antenna. As a result of this coupling, there appears a large negative dc voltage (V DC) on the surface of material which insulates the antenna conductor from the plasma. The magnitude of V DC is directly measured as a function of rf power, thickness of the insulating material, and the position along the antenna. A simple model to describe the electrostatic antenna-plasma coupling is proposed. In addition, the effect of Faraday shields on the inductively coupled rf discharge is presented.