X-ray scattering microscope with a Wolter mirror
X-ray scattering microscope with a Wolter mirror
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带 Wolter 镜的 X 射线散射显微镜
DOI：
10.1063/1.1487888
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发表时间：
2002
影响因子：
1.6
通讯作者：
M. Ando
中科院分区：
文献类型：
--
作者：
H. Takano;S. Aoki;M. Kumegawa;N. Watanabe;Takuji Ohhigashi;T. Aota;Kimitake Yamamoto;H. Yokosuka;R. Tanoue;Yuji Tsujita;M. Ando
使用Wolter镜（放大10倍）获得全场X射线散射显微图像。来自Photon Factory的偏转磁体束线的同步加速器辐射白色束（4-20 keV）用于获得X射线散射图像。该系统可用于多千电子伏的X射线范围（4-12 keV）与沃尔特镜。这张图像是由物体散射的x射线形成的，这是一种暗场图像。用这种显微镜可以对低吸收材料成像。评价了系统的灵敏度，并估计了检测限。
Full-field x-ray scattering microscopic images were obtained with a Wolter mirror (×10 magnification). A synchrotron radiation white beam (4–20 keV) from a bending magnet beamline at the Photon Factory was used to obtain x-ray scattering images. The system was available for multi-kilo-electron-volt x-ray range (4–12 keV) with the Wolter mirror. The image was formed only with scattered x rays from the object, which is kind of a dark-field image. Very low absorptive materials could be imaged with this microscope. Sensitivity of the system was evaluated and also the detection limit was estimated.
用于软 X 射线显微镜的 Wolter I 型反射镜的制造和测试
DOI：
--
发表时间：
2004
期刊：
Proceeding of SPIE Volume5533
影响因子：
--
作者：
M.Hoshino;S.Aoki;N.Watanabe;S.Hirai
通讯作者：
S.Hirai