Lithographically patterned wires of the charge-density-wave conductor Rb0.30MoO3
Lithographically patterned wires of the charge-density-wave conductor Rb0.30MoO3
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电荷密度波导体 Rb0.30MoO3 的光刻图案线
DOI：
10.1063/1.371383
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发表时间：
1999
影响因子：
3.2
通讯作者：
H. V. D. Zant
中科院分区：
文献类型：
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作者：
O. Mantel;C. Bal;C. Langezaal;C. Dekker;H. V. D. Zant
我们开发了一种电荷密度波(CDW)导体Rb0.30MoO_3薄膜的图案化技术。通过光刻和Ar离子研磨，确定了薄膜中的线结构。Rb0.30MoO_3丝由(亚)微米Au接触，这种接触是用光学和电子束光刻技术制造的。电输运测量清楚地显示了我们的图案化结构中的CDW状态，包括CDW滑动。图案化导线使得在介观长度尺度上研究CDW成为可能。
We have developed a technology for the patterning of thin films of the charge-density-wave (CDW) conductor Rb0.30MoO3. By means of photolithography and Ar-ion milling, wire structures are defined in the films. The Rb0.30MoO3 wires are contacted by (sub)micron Au contacts, which are fabricated by optical and electron-beam lithographic techniques. Electrical transport measurements clearly demonstrate the CDW state in our patterned structures, including CDW sliding. Patterned wires enable the study of CDWs on mesoscopic length scales.
自旋涨落材料的电动力学
DOI：
--
发表时间：
2007
期刊：
影响因子：
--
作者：
V. Stankevich;S. Kimura;他8名;T. Ito;S. Kimura
通讯作者：
S. Kimura