In-process measuring procedure for sub-100 nm structures
In-process measuring procedure for sub-100 nm structures
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DOI：
10.2351/1.4719936
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发表时间：
2012-07
影响因子：
2.1
通讯作者：
M. Zimmermann;A. Tausendfreund;S. Patzelt;G. Goch;S. Kieß;M. Z. Shaikh;M. Gregoire;S. Simon
中科院分区：
文献类型：
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作者：
M. Zimmermann;A. Tausendfreund;S. Patzelt;G. Goch;S. Kieß;M. Z. Shaikh;M. Gregoire;S. Simon
快速、无损的激光散射测量可表征生产过程中亚 100 nm 结构的表面质量。目的是检测有缺陷的表面结构。测量过程基于测量的散斑图案与由无缺陷和有缺陷的表面结构引起的大量数值计算的散斑图案的初步比较。比较显示了特有的光散射效应，必须通过过程中的测量装置来检测。在图形处理单元上实现的高效严格的算法可在合理的计算时间内计算散射光强度分布。使用角度分辨光散射测量装置进行测量。该测量程序适用于氧化锌纳米草表面。
Fast and nondestructive laser light scattering measurements characterize the quality of surfaces with sub-100 nm structures during the production process. The aim is to detect defective surface structures. The measurement procedure is based on a primary comparison of measured speckle patterns with a multitude of numerically calculated speckle patterns caused by defect-free and defective surface structures. The comparison shows characteristic light scattering effects, which have to be detected by the in-process measurement setup. An efficient rigorous algorithm, implemented on a graphics processing unit, calculates the scattered light intensity distributions within reasonable computing times. The measurements are performed with an angle resolved light scattering measurement setup. The measuring procedure is applied to zinc oxide nanograss surfaces.